Lithography is the transfer of a pattern from a master slide or plate or mask to another medium. In today's optical lithography, the process of passing light through a mask to pattern a polymer film is crucial for the mass production of integrated circuits. Nanolithography using focused beams of either electrons, ions or photons as well as using scanning probe microscopes to chemically, physically or thermally modify surface layers of material with nanoscale precision. Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness.
- Track 1-1 Nanopatterning and Nanotopography
- Track 2-2 Micro and Nanoimprint solutions
- Track 3-3 Nano-electro-mechanical systems (NEMS)
- Track 4-4 Quantum Dots
- Track 5-5 Nanowires, Nano rods & Nanofibers
- Track 6-6 Nanotweezers